Course objective: This course is designed to provide a deep understanding of IC fabrication technology, various thin film deposition and characterization techniques.
Course outcome:
After learning the course, the students should be able:
1. To understand the basics of IC fabrication.
2. To understand the basics of lithography, etching, NEMS, MEMS etc.
3. To have knowledge of various thin film deposition and characterization techniques.
- Course creator: Susheel Sharma